Products
Oxidation / Diffusion / LPCVD

SPT offers a range of large batch vertical furnaces. We are able to offer both new and factory-certified re-manufactured systems as well as custom system conversions to meet specific engineering requirements. The production-proven vertical furnaces deliver superior process results, high productivity and the lowest cost of ownership (CoO).
Our diverse process portfolio includes:
- Wet/dry thermal oxide
- Radical oxidation
- Stoichiometric and stress controlled SiN
- TEOS, SiH4 and DCS-based SiO2
- Doped and un-doped polysilicon
- 100 to >1200°C anneals
APCVD

SPT offers solutions for Atmospheric Pressure CVD of SiH4 or TEOS based dielectrics. Our patented Watkins Johnson (WJ) linear injector technology enables precise, repeatable deposition of doped or un-doped films with no transient film properties and uniform gap fill across the wafer.
Wafer transport is via a self-cleaning belt conveyor enabling excellent system reliability with the lowest CoO for dielectric gap-fill.
Factory-certified re-manufactured systems are available with the following platform options:
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WJ-999 - 3 process chambers for TEOS and hydride processes
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WJ-1000 – 4 process chambers for TEOS and hydride processes
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WJ-1500 - 4 chambers for TEOS processes only